New propagation regimes for light arise from the ability to tune the dielectric permittivity to extremely low values. Here, we demonstrate a universal approach based on the low linear permittivity values attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index, which enables remarkable light-induced changes of the material properties. Experiments performed on Al-doped ZnO (AZO) thin films show a sixfold increase of the Kerr nonlinear refractive index (n(2)) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to ultrafast light-induced refractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.

Enhanced Nonlinear Refractive Index in epsilon-Near-Zero Materials

Caspani L;Clerici M;
2016-01-01

Abstract

New propagation regimes for light arise from the ability to tune the dielectric permittivity to extremely low values. Here, we demonstrate a universal approach based on the low linear permittivity values attained in the epsilon-near-zero (ENZ) regime for enhancing the nonlinear refractive index, which enables remarkable light-induced changes of the material properties. Experiments performed on Al-doped ZnO (AZO) thin films show a sixfold increase of the Kerr nonlinear refractive index (n(2)) at the ENZ wavelength, located in the 1300 nm region. This in turn leads to ultrafast light-induced refractive index changes of the order of unity, thus representing a new paradigm for nonlinear optics.
2016
Caspani, L; Kaipurath, Rpm; Clerici, M; Ferrera, M; Roger, T; Kim, J; Kinsey, N; Pietrzyk, M; Di Falco, A; Shalaev, Vm; Boltasseva, A; Faccio, D
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11383/2161019
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