The DAFNE Beam Test Facility (BTF) provides electron and positron beams in a wide range of intensity, from single particle up to 1010 particles per pulse, and energy, from a few tens of MeV up to 800 MeV. The pulse time width can be 1 or 10 ns long, and the maximum repetition rate is 50 Hz. The large range of operation of the facility requires the implementation of different beam profile and multiplicity monitors. In the single particle operation mode, and up to a few 103 particles/pulse, the beam spot profile and position are measured by a x-y scintillating fiber system with millimetric resolution and multi-anode PMT readout. From a few tens up to 106-7 particles per pulse, a silicon chamber made of two 9.5x9.5 cm2 wide 400um thick silicon strip detectors organized in a x-y configuration with a pitch of 121um has been developed. Once calibrated, the system can be used also as an intensity monitor. The description of the devices and the results obtained during the data taking periods of several experiments at the facility are presented.
PROFILE MONITORS FOR WIDE MULTIPLICITY RANGE ELECTRON BEAMS
BULGHERONI, ANTONIO;CAPPELLINI, CHIARA;PREST, MICHELA;MOZZANICA, ALDO;
2006-01-01
Abstract
The DAFNE Beam Test Facility (BTF) provides electron and positron beams in a wide range of intensity, from single particle up to 1010 particles per pulse, and energy, from a few tens of MeV up to 800 MeV. The pulse time width can be 1 or 10 ns long, and the maximum repetition rate is 50 Hz. The large range of operation of the facility requires the implementation of different beam profile and multiplicity monitors. In the single particle operation mode, and up to a few 103 particles/pulse, the beam spot profile and position are measured by a x-y scintillating fiber system with millimetric resolution and multi-anode PMT readout. From a few tens up to 106-7 particles per pulse, a silicon chamber made of two 9.5x9.5 cm2 wide 400um thick silicon strip detectors organized in a x-y configuration with a pitch of 121um has been developed. Once calibrated, the system can be used also as an intensity monitor. The description of the devices and the results obtained during the data taking periods of several experiments at the facility are presented.
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